Desk Sputter Coater
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. This process is commonly utilized for thin-film deposition, etching and analytical techniques.
Applications
- Coating the non-conductive materials with nanofilms of the noble metals
- Sample preparation for SEM
Special Features
- Touchscreen and colorful display
- Thickness monitoring system for thickness measurement
- Manual and automatic sputtering regarding time and thickness
- Able to plot sputtering parameters graphs
- USB port
Technical Specifications
- Pump: rotary vane, two-stage, direct drive 170 l/m
- Ultimate vacuum: less than 30 millitorr
- Power supply: 0-100 mA, DC 800 V, 50 Hz
- Electric valve: ΒΌ inch
- Magnetron cathode: 2 inch