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Desk Sputter Coater

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. This process is commonly utilized for thin-film deposition, etching and analytical techniques.


  • Coating the non-conductive materials with nanofilms of the noble metals
  • Sample preparation for SEM

Special Features

  • Touchscreen and colorful display
  • Thickness monitoring system for thickness measurement
  • Manual and automatic sputtering regarding time and thickness
  • Able to plot sputtering parameters graphs
  • USB port

Technical Specifications

  • Pump: rotary vane, two-stage, direct drive 170 l/m
  • Ultimate vacuum: less than 30 millitorr
  • Power supply: 0-100 mA, DC 800 V, 50 Hz
  • Electric valve: ΒΌ inch
  • Magnetron cathode: 2 inch